The ability of block copolymer self-assemble into well-ordered structures on nanometer scale has captured much attention of scientists and technologists over the past decades from both experimental and theoretical owing to the potential applications of the structures in data storage
electronics
combinatorial chemistry
masks
and membranes
etc. The applied ordered nanostructures of block copolymer thin film is the perpendicular ones. However
it is a challenge to manipulate the process of the self-assembly of block copolymer thin film to obtain perpendicular ordered nanostructures and enable a broad range of applications. Here
some well-studied approaches in orienting the microdomains normal to the substrates in block copolymer thin films have been reviewed and the orientation mechanisms of some typical block copolymer thin films have been analyzed. Based on the approaches
an outlook of the controlling of the microdomains orientation has been prospected.
Computer Simulation of Self-assembly Behavior of Cyclic Symmetric Diblock Copolymers in Thin Film
Preparation and Drug Release Behavior of Nano-drug Carrier Based on Poly(glutamate-tyrosine-alanine) Block Copolymer
The Method for Distinguishing Random Copolymer, Block Copolymer and Mixed Homopolymer
Recent Progress on Polyolefin-block-polar-polymer Block Copolymer
Stimuli-Responsive Organic/Inorganic Hybrid Vesicles Based on Reactive Diblock Copolymers of 2-(Dimethylamino) ethyl Methacrylate and 3-(Trimethoxysilyl) propyl Methacrylate
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