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Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths
更新时间:2024-07-02
    • Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths

    • Polymer Bulletin   Vol. 37, Issue 8, Pages: 1037-1048(2024)
    • 作者机构:

      1..烟台希尔德材料科技有限公司,烟台  264006

      2..山东凯瑞尔光电科技有限公司,烟台  264006

    • DOI:10.14028/j.cnki.1003-3726.2024.23.416    

      CLC:
    • Published:2024-08

      Received:19 December 2023

      Accepted:19 February 2024

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  • Bi, Y. G.; Zou, L. L.; Cui, S. Y.; Xu, J.; Li, X. K.; Fu, T. L.; Wang, Z. Y.; Zhao, Z. W.; Wang, Y. J.; Liu, H. Y.; Hong, H. Z.; Dou, F. Research progress on polyhedral oligomeric silsesquioxanes in photolithography technology across various wavelengths. Polym. Bull. (in Chinese), 2024, 37(8), 1037–1048 DOI: 10.14028/j.cnki.1003-3726.2024.23.416.

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