Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths

BI Yan-gang; ZOU Li-li; CUI Shu-ying; XU Jing; LI Xiao-ke; FU Tian-lin; WANG Zhen-yu; ZHAO Zeng-wu; WANG Ying-jie; LIU Hai-yan; HONG Hai-zhe; DOU Fan

doi:10.14028/j.cnki.1003-3726.2024.23.416

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Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths

更新时间：2024-07-02

- Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths
- Polymer Bulletin Vol. 37, Issue 8, Pages: 1037-1048(2024)
- 作者机构：
  
  1..烟台希尔德材料科技有限公司，烟台　 264006
  2..山东凯瑞尔光电科技有限公司，烟台　 264006
- 作者简介：
- 基金信息：
- DOI：10.14028/j.cnki.1003-3726.2024.23.416
  CLC：
- Published：2024-08，
  
  Received：19 December 2023，
  
  Accepted：19 February 2024
- 稿件说明：
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毕研刚, 邹丽丽, 崔淑英, 徐晶, 李晓珂, 傅天林, 王振羽, 赵增武, 王英杰, 刘海燕, 洪海哲, 豆帆. 聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展. 高分子通报, 2024, 37(8), 1037–1048

Bi, Y. G.; Zou, L. L.; Cui, S. Y.; Xu, J.; Li, X. K.; Fu, T. L.; Wang, Z. Y.; Zhao, Z. W.; Wang, Y. J.; Liu, H. Y.; Hong, H. Z.; Dou, F. Research progress on polyhedral oligomeric silsesquioxanes in photolithography technology across various wavelengths. Polym. Bull. (in Chinese), 2024, 37(8), 1037–1048
毕研刚, 邹丽丽, 崔淑英, 徐晶, 李晓珂, 傅天林, 王振羽, 赵增武, 王英杰, 刘海燕, 洪海哲, 豆帆. 聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展. 高分子通报, 2024, 37(8), 1037–1048 DOI： 10.14028/j.cnki.1003-3726.2024.23.416.

Bi, Y. G.; Zou, L. L.; Cui, S. Y.; Xu, J.; Li, X. K.; Fu, T. L.; Wang, Z. Y.; Zhao, Z. W.; Wang, Y. J.; Liu, H. Y.; Hong, H. Z.; Dou, F. Research progress on polyhedral oligomeric silsesquioxanes in photolithography technology across various wavelengths. Polym. Bull. (in Chinese), 2024, 37(8), 1037–1048 DOI： 10.14028/j.cnki.1003-3726.2024.23.416.

摘要

Abstract

关键词

聚倍半硅氧烷透明性低介电性耐蚀刻性光刻技术

Keywords

Polyhedral oligomeric silsesquioxanesTransparencyLow dielectricEtching resistanceLithography technology

references

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