聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展

毕研刚; 邹丽丽; 崔淑英; 徐晶; 李晓珂; 傅天林; 王振羽; 赵增武; 王英杰; 刘海燕; 洪海哲; 豆帆

doi:10.14028/j.cnki.1003-3726.2024.23.416

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聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展

综述 | 更新时间：2024-07-02

- 聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展
- Research Progress on Polyhedral Oligomeric Silsesquioxanes in Photolithography Technology across Various Wavelengths
- 高分子通报 2024年37卷第8期页码：1037-1048
- 作者机构：
  
  1..烟台希尔德材料科技有限公司，烟台　 264006
  2..山东凯瑞尔光电科技有限公司，烟台　 264006
- 作者简介：
  
  *毕研刚，E-mail: longgang-54@126.com；崔淑英，E-mail: sukyoung@126.com；豆帆，E-mail: dfshield@126.com
  *毕研刚，E-mail: longgang-54@126.com；崔淑英，E-mail: sukyoung@126.com；豆帆，E-mail: dfshield@126.com
  *毕研刚，E-mail: longgang-54@126.com；崔淑英，E-mail: sukyoung@126.com；豆帆，E-mail: dfshield@126.com
- 基金信息：
  
  烟台开发区科技领军人才项目(2022RC003)
- DOI：10.14028/j.cnki.1003-3726.2024.23.416
  中图分类号：
- 纸质出版日期：2024-08，
  
  收稿日期：2023-12-19，
  
  录用日期：2024-02-19
- 稿件说明：
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毕研刚, 邹丽丽, 崔淑英, 徐晶, 李晓珂, 傅天林, 王振羽, 赵增武, 王英杰, 刘海燕, 洪海哲, 豆帆. 聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展. 高分子通报, 2024, 37(8), 1037–1048

Bi, Y. G.; Zou, L. L.; Cui, S. Y.; Xu, J.; Li, X. K.; Fu, T. L.; Wang, Z. Y.; Zhao, Z. W.; Wang, Y. J.; Liu, H. Y.; Hong, H. Z.; Dou, F. Research progress on polyhedral oligomeric silsesquioxanes in photolithography technology across various wavelengths. Polym. Bull. (in Chinese), 2024, 37(8), 1037–1048
毕研刚, 邹丽丽, 崔淑英, 徐晶, 李晓珂, 傅天林, 王振羽, 赵增武, 王英杰, 刘海燕, 洪海哲, 豆帆. 聚倍半硅氧烷类树脂在各波长光刻技术中的研究进展. 高分子通报, 2024, 37(8), 1037–1048 DOI： 10.14028/j.cnki.1003-3726.2024.23.416.

Bi, Y. G.; Zou, L. L.; Cui, S. Y.; Xu, J.; Li, X. K.; Fu, T. L.; Wang, Z. Y.; Zhao, Z. W.; Wang, Y. J.; Liu, H. Y.; Hong, H. Z.; Dou, F. Research progress on polyhedral oligomeric silsesquioxanes in photolithography technology across various wavelengths. Polym. Bull. (in Chinese), 2024, 37(8), 1037–1048 DOI： 10.14028/j.cnki.1003-3726.2024.23.416.

摘要

Abstract

关键词

聚倍半硅氧烷透明性低介电性耐蚀刻性光刻技术

Keywords

Polyhedral oligomeric silsesquioxanesTransparencyLow dielectricEtching resistanceLithography technology

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