Progress in Development-free Vapor Photolithography

Xiao-yin HONG; Zhong-zhe LI; Dan LIU; Bing WU; Jian-ping LU; Sheng-quan DUAN; Ming CHEN; Pei-qing WANG

doi:10.14028/j.cnki.1003-3726.2002.03.001

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Progress in Development-free Vapor Photolithography

更新时间：2022-09-18

- Progress in Development-free Vapor Photolithography
- Polymer Bulletin Vol. 15, Issue 3, Pages: 1-4,18(2002)
- 作者机构：
  
  清华大学化学系，北京　100084
- 作者简介：
- 基金信息：
- DOI：10.14028/j.cnki.1003-3726.2002.03.001
  CLC：
- Published：2002-06，
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Xiao-yin HONG, Zhong-zhe LI, Dan LIU, Bing WU, Jian-ping LU, Sheng-quan DUAN, Ming CHEN, Pei-qing WANG. Progress in Development-free Vapor Photolithography. [J]. Polymer Bulletin 15(3):1-4,18(2002)
DOI：

Xiao-yin HONG, Zhong-zhe LI, Dan LIU, Bing WU, Jian-ping LU, Sheng-quan DUAN, Ming CHEN, Pei-qing WANG. Progress in Development-free Vapor Photolithography. [J]. Polymer Bulletin 15(3):1-4,18(2002) DOI： 10.14028/j.cnki.1003-3726.2002.03.001.

摘要

无显影气相光刻技术是我国在1980年发明的一种独特的光刻技术

具有不需要显影

分辨率高等优点。但它的机理并不清楚。本文介绍十多年来在无显影气相光刻机理研究方面的成果。实验证明

无显影气相光刻是以光致光刻胶膜内的诱蚀剂浓度差为基础的方法；而传统的光刻方法是基于光致光刻胶膜溶解度差的方法。由于两者的光刻原理不同

导致了他们间光刻效果和应用范围之区别。所得机理研究之结果可以解释无显影气相光刻中的各种独特的现象并可指导无显影气相光刻技术的发展

克服技术中存在的问题。

Abstract

Development-free vapor Photolithography

which was discovered in 1980

is a very unique technology

however

its mechanism was not clearly understood.A serious of researches on mechanism was carried out by Xiaoyin Hong et al.In this paper the results of the mechanism researches are given.It was proved that the DFVP is based on the photo-induced difference of concentration of etching accelerators in the polymer film

while the traditional photolithography is base on photo-induced difference of solubility of the polymer film. Based on the proposed mechanism some phenomenon involved in DFVC are explained and some improvements have been made.

关键词

光刻光刻胶显影二氧化硅氢氟酸

Keywords

PhotolithographyPhotoresistDevelopmentSilicon dioxideHydrofluoride acid

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