Progress in the Research of Chemical Amplified Photoresist

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- Progress in the Research of Chemical Amplified Photoresist
- Polymer Bulletin Vol. 18, Issue 2, Pages: 70-80(2005)
- 作者机构：
  
  南开大学高分子化学研究所，吸附分离功能高分子材料国家重点实验室，天津　300071
- 作者简介：
- 基金信息：
- DOI：10.14028/j.cnki.1003-3726.2005.02.011
  CLC：
- Published：2005-04，
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Chun-wei WANG, Hong LI, Xiao-xia ZHU. Progress in the Research of Chemical Amplified Photoresist. [J]. Polymer Bulletin 18(2):70-80(2005)
DOI：

Chun-wei WANG, Hong LI, Xiao-xia ZHU. Progress in the Research of Chemical Amplified Photoresist. [J]. Polymer Bulletin 18(2):70-80(2005) DOI： 10.14028/j.cnki.1003-3726.2005.02.011.

综合论述了化学放大光刻胶类高分子材料，并着重介绍193

光刻胶材料研究的最近进展。

Photoresists are polymeric materials

which play the key role in the manufacturing of electronic devices. Here the brief history of the development and the components were reviewed

moreover the emphasis were especially focused on the photoresists

which may applied in193nm.

光刻胶化学放大微版印刷术

PhotoresistChemical AmplifiedMicrolithography

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