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Low Oxygen Inhibition Thiol-ene Photopolymerization System for Near-infrared Ink Direct Writing 3D Printing
更新时间:2023-09-19
    • Low Oxygen Inhibition Thiol-ene Photopolymerization System for Near-infrared Ink Direct Writing 3D Printing

    • Polymer Bulletin   Vol. 36, Issue 10, Pages: 1312-1320(2023)
    • 作者机构:

      江南大学化学与材料工程学院,无锡 214122

    • DOI:10.14028/j.cnki.1003-3726.2023.10.007    

      CLC:
    • Published:20 October 2023,

      Received:13 February 2023,

      Revised:03 March 2023,

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  • HU Peng, PAN Yue, XU Hang, MIAO Jia-tao, LIU Ren. Low Oxygen Inhibition Thiol-ene Photopolymerization System for Near-infrared Ink Direct Writing 3D Printing. [J]. Polymer Bulletin 36(10):1312-1320(2023) DOI: 10.14028/j.cnki.1003-3726.2023.10.007.

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