Lithography is the core step of chip manufacturing. The lithography machine and photoresist are interdependent and indispensable in the lithography process. However

photoresist materials have received less attention although they are of the same importance as the lithography machine. On the one hand

there are few news media reports about photoresist materials. And most of what people see is related to the news of lithography machine. On the other hand

there are few domestic famous companies engaged in photoresist related industry research and development. At present

the domestic medium or low-end photoresist for printed circuit board has been basically localized

and the semiconductor photoresist for high-end chip manufacturing almost depends on imports. To overcome the foreign monopoly of chip manufacturing industry

the domestic production of high-end photoresist is imperative

especially the extreme ultraviolet photoresist suitable for high-end chip manufacturing. The most advanced semiconductor chips such as 5 nm and 7 nm were produced by extreme ultraviolet lithography with its corresponding photoresist. This review focuses on the photoresist materials for latest extreme ultraviolet lithography technology

and summarizes the organic photoresist materials and organic-inorganic hybrid photoresist materials. We believed that these references and progress can provide a certain guidance for developing new types of photoresist designed by scientists or engineers

as well as for overcoming the bottleneck of photoresist industry.